Monthly Archive: January 2013

Jan 28

Opportunity: NVM Memory Architect (Flash, CBRAM, OTP) Paris, France

Recruiter: IC Resources Ltd Posted: 24 January 2013 Ref: J20821 Contact: David Dixon Locatio: Paris Job Function: Research & Development Specialist Area: Analogue Contract Type: Permanent Hours: Full Time Salary: Salary upon experience + benefits Apply now Further information Excellent opportunity for an NVM Memory Architect to join leading semiconductor operation based …

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Jan 23


There has been lots of talk recently about IBM’s two terminal access device (AD) developed for PCRAM and ReRAM based on MIEC (Mixed Electronic Ionic Conduction). With a highly non-linear IV characteristic (far more non-linear than a pn diode for example), it has been attracting a lot of attention for BEOL memory. It appears to …

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Jan 15

The View from HP: Part 2

Three authors with strong links to HP (they have all worked at HP but two have moved on) have recently published a thorough review of ReRAM and CBRAM materials and mechanisms*. The article appeared in Nature Nanotechnology and a colleague was kind enough to alert me to the paper and supplementary material (which alone has …

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Jan 11

Opportunity: Senior Materials Development Engineer, Adesto Technologies

Description: Adesto Technologies is seeking a thin films process development engineer to drive new materials development on an R&D sputter deposition tool to support the introduction and commercialization of a novel BEOL alternate memory technology. Location: Sunnyvale, CA 94089 Responsibilities: The successful candidate will have the following responsibilities: – Primary owner for the R&D sputter …

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Jan 07



Nantero have been in the news recently following their successfully $10M Series D round of financing. Nantero was started in 2001 by three co-founders from Harvard University and Reed College. It was good to hear the company was still in business as they have, as far as I know, a unique approach to next generation …

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Jan 03

Happy New Year and Some Crystal Ball Gazing


Admittedly rather dusty and rusty after not being used since early 1999 for a panel discussion looking at the prospects for 25nm lithography at the SPIE Microlithography* conference, I found it at the back of my wardrobe. So I thought maybe it would work better this time if I restricted the search to the next …

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